SERDAR AKSU: INDUSTRY SITES
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JOBS |
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SEMICONDUCTOR / INTEGRATED
CIRCUIT FABRICATION |
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ELECTROCHEMISTRY |
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MATERIALS SCIENCE |
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WEB RESOURCES ON COPPER INTERCONNECTION AND
CMP
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ON-LINE JOURNALS
ARTICLES
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Copper
CMP: A Question of Tradeoffs
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Copper
Metrology Gains Complexity, Capabilities
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Copper,
Low-k Metrology Scale the Learning Curve
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Dual-Damascene:
Overcoming Process Issues
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Evaluating
and Treating CMP Wastewater
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Photostrip
Faces 300 mm, Copper and Low-k Convergence
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A
Process for Efficient Treatment of Cu CMP Wastewater
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Tantalum,
Copper and Damascene: The Future of Interconnects
· The future of interconnection technology
· Damascene copper electroplating for chip interconnections
INSTITUTIONS
· SEMATECH
ON-LINE HELP
· Semiseek
IC MANUFACTURERS
· IC Manufacturers from Semiseek
WEB RESOURCES ON ELECTROCHEMISTRY
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ON-LINE JOURNALS
INSTITUTIONS
OTHERS
· Fundamentals of Copper Electroplating
WEB RESOURCES ON CORROSION
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ON-LINE HELP
INSTITUTIONS
ON-LINE JOURNALS
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You can reach me at: serdar@socrates.berkeley.edu |