Fiona M. Doyle homepage

Some Recent Publications (pdf files)

• Fiona M. Doyle, “Teaching and Learning Environmental Hydrometallurgy”, submitted to Hydrometallurgy
• Claudia V. Diniz, Virginia S. T. Ciminelli, and Fiona M. Doyle, “The use of the chelating resin Dowex M-4195 in the adsorption of selected heavy metal ions from manganese solutions”, submitted to Hydrometallurgy
• J. W. Evans, Ran Ding, Adam Neugebauer, F. M. Doyle and V. Jiricny, “Copper electrodeposition onto extended surface area electrodes and the treatment of copper-containing waste streams”, Proceedings, Metal Separation Technologies III – Prof. Holappa Honorary Symposium, Copper Mountain, Colorado, June 20-24, 2004.
• Ling Wang and Fiona M. Doyle, “Known effects of pattern characteristics on copper CMP and future directions”, Proceedings Ninth International Conference on Chemical-Mechanical Polish (CMP) Planarization for ULSI Multilevel Interconnections, Marina Del Rey, California, February 23-26, 2004, IMIC Headquarters, Tampa, FL.
• R. Ding, J. W. Evans and F. M. Doyle “An Investigation of the Electrodeposition of Copper Relevant to the Removal of Dissolved Copper from Semiconductor Industry Waste Streams”, in Electrochemistry in Mineral and Metal Processing VI, eds. R. Woods, G. Kelsall and F.M. Doyle, The Electrochemical Society, Pennington N.J., (2003), P -2003-18, ISBN: 1-56677-401-2, pp. 326-335.
• Serdar Aksu, Ling Wang and Fiona M. Doyle, “Effect of hydrogen peroxide on the oxidation of copper in CMP slurries containing glycine”, Journal of the Electrochemical Society, 150 (11) (2003) pp. G718-G723.
• Fiona M. Doyle and Ling Wang, “Chemical and Electrochemical Characterization of Peroxide-Induced Passivation of Copper in Aqueous Glycine Solutions” Proceedings VMIC 2003 (Twentieth International VLSI Multilevel Interconnection Conference), Marina Del Rey, California, September 2003, IMIC Headquarters, Tampa, FL, Library of Congress No. 89-644090, pp. 267-276.
• Fiona M. Doyle, “Ion Flotation - Its Potential for Hydrometallurgical Operations”, International Journal of Mineral Processing. 72 (2003) pp. 387-399.
• William Ewing, James W. Evans and Fiona M. Doyle, “The effect of plating additives on the recovery of copper from dilute aqueous solutions using chelating resins”, in C.A. Young, A.M. Alfantazi, C.G. Anderson, A. James, D.B. Dreisinger, and B. Harris (Eds.) Hydrometallurgy 2003, Proceedings of the 5th International Symposium, TMS, Warrendale, PA (2003) pp. 753-762.
• Ling Wang and Fiona M. Doyle, “Mechanisms of Passivation of Copper in CMP Slurries Containing Peroxide and Glycine”, in Chemical-Mechanical Planarization, eds. D.S. Boning, K. Devriendt, M.R. Oliver , D.J. Stein, and I. Vos, Mat. Res. Soc. Symp. Proc. Vol. 767, Materials Research Society, Warrendale, PA (2003) pp. F6.5.1-F6.5.10
• Christopher Lubeck, Michael Chin, and Fiona M. Doyle, “Functionalization of a synthetic polymer to create inorganic/polymer hybrid materials”, Functional Fillers and Nanoscale Minerals, eds. J.J. Kellar, M.A. Herpfer and B.M. Moudgil, SME, Littleton, CO, 2003, pp. 95-104.
• Fiona M. Doyle and Zhendong Liu, “The Effect of Triethylenetetraamine (Trien) on the Ion Flotation of Cu2+ and Ni2+”, Journal of Colloids and Interface Science, 258 (2) (2003) pp. 396-403.
• Ran Ding, William Ewing, Fiona M. Doyle and James W. Evans, “In-process recycling of copper from semiconductor processing solutions”, Proceedings AIChE Annual Meeting, Indianapolis, IN, November 2002.
• Serdar Aksu and Fiona M. Doyle, "Electrochemistry of Copper in the Chemical Mechanical Planarization (CMP) Slurries Containing Glycine and Hydrogen Peroxide”, in Chemical Mechanical Polishing V, Ed. S. Seal, The Electrochemical Society, Pennington, New Jersey, PV-2002-1 (2002) pp. 79-90.
• Claudia V. Diniz, Fiona M. Doyle, and Virginia S. T. Ciminelli, “Effect of pH on the adsorption of selected heavy metal ions from concentrated chloride solutions by the chelating resin Dowex M-4195”, Separation Science and Technology, 37 (14) (2002) 3169-3185.
• Serdar Aksu and Fiona M. Doyle, “Electrochemistry of Copper in Aqueous Ethylenediamine Solutions”, Journal of the Electrochemical Society, 149 (7) (2002) B340-B347.
• Serdar Aksu and Fiona M. Doyle, “The role of glycine in the chemical mechanical planarization (CMP) of copper”, Journal of the Electrochemical Society, 149, (6) (2002) G352-G361.
• Fiona M. Doyle, “Aqueous processing for environmental protection", Proceedings, Spring Meeting of the Korean Institute of Mineral and Energy Resource Engineers, Hanyang University, Seoul, Korea, April 2002.
• Serdar Aksu and Fiona M. Doyle, “Electrochemistry of copper in chemical mechanical planarization (CMP) slurries containing glycine”, Proceedings VMIC 2001 (Eighteenth International VLSI Multilevel Interconnection Conference), Santa Clara, CA, November 2001.
• Zhendong Liu and Fiona M. Doyle, "Modeling metal ion removal in alkylsulfate ion flotation systems", Minerals and Metallurgical Processing, 18 (2001) pp. 167-171.
• Serdar Aksu and Fiona M. Doyle, "Electrochemistry of copper in aqueous glycine solutions", Journal of the Electrochemical Society, 148 (1) (2001) pp. B51-B57. (pdf file)
• Zhendong Liu and Fiona M. Doyle, “A thermodynamic approach to ion flotation. I. Kinetics of Cupric Ion Flotation with Alkylsulfates”, Colloids and Surfaces A: Physicochemical and Engineering Aspects., 178 (2001) pp. 79-92.
• Zhendong Liu and Fiona M. Doyle, “A thermodynamic approach to ion flotation. II. Metal Ion Selectivity in the SDS-Cu-Ca and SDS-Cu-Pb Systems”, Colloids and Surfaces A: Physicochemical and Engineering Aspects., 178 (2001) pp. 93-103.
• Serdar Aksu and Fiona M. Doyle, "The Role of EDTA and Glycine in the Chemical Mechanical Planarization (CMP) of Copper", Proceedings of the Second International Conference on Processing Materials for Properties, eds. B. Mishra and C. Yamauchi, TMS, Warrendale, PA, 2000. pp. 225-230. (pdf file)
• Claudia Villa Diniz, Afonso Henriques Martins, and Fiona M. Doyle, "Uptake of Heavy Metals by Chelating Resins from Acidic Manganese Chloride Solution", Minerals and Metallurgical Processing, 17 (4) (2000) pp. 217-222.
• Mark G. Benz, Juliana C. Shei, Christina H. Chen, Marlin S. Walmer, and Fiona M. Doyle, “High-energy-product (Pr, Nd, Ce)FeB magnets produced directly from mixed-rare-earth-oxide feed for MRI medical imaging applications” Proceedings REMXVI-2000, 16th International Workshop on Rare-Earth Magnets and Their Applications, Sendai, Japan, September 2000.
• Serdar Aksu and Fiona M. Doyle, "Potential-pH Diagrams for Copper in Aqueous Solutions of Various Organic Complexing Agents", in Electrochemistry in Mineral and Metal Processing V, eds. R. Woods and F.M. Doyle, The Electrochemical Society, Pennington N.J., pp. 258-269, 2000. (pdf file)
• Fiona M. Doyle, Mark G. Benz, Juliana C. Shei, Ding Shan Bao, Hao Xian Ku, and Ni De Zhen, “Direct production of mixed, rare earth oxide feed for high energy-product magnets”, in Rare Earths and Actinides: Science, Technology and Applications IV, eds. R.G. Bautista and B. Mishra, TMS, Warrendale, PA, 2000, pp. 31-44